ТАШАТОВ, А., ЭШБОБОЕВ C., & ЭРГАШОВ, Ё. (2026). APPLICATION OF ION IMPLANTATION FOR CREATION OF ULTRATHIN OHMIC CONTACTS ON THE SURFACE OF SILICON FILMS. «ACTA NUUz», 3(3.1), 496–499. Retrieved from http://journals.nuu.uz/index.php/actanuuz/article/view/14201