YOKUB ERGASHOV, Sardor ESHBOBOEV; ALLANAZAR TASHATOV. SURFACE MORPHOLOGY AND STRUCTURAL FEATURES OF NICKEL SILICIDE THIN FILMS FABRICATED BY ION-PLASMA DEPOSITION . «ACTA NUUz», [S. l.], v. 3, n. 3.2, p. 494–497, 2025. DOI: 10.69617/nuuz.v3i3.2.9284. Disponível em: http://journals.nuu.uz/index.php/actanuuz/article/view/9284. Acesso em: 5 dec. 2025.