BAHROM EGAMBERDIEV; AMIN MALLAEV; SHOHRUH SAYFULLOEV. STUDY OF THE DISTRIBUTION PROFILE OF ION- IMPLANTED IN SILICON AND INFLUENCE THERMAL ANNEALING ON THE STRUCTYRE OF IRON SILICIDES. «ACTA NUUz», [S. l.], v. 3, n. 3.1, p. 524–528, 2024. DOI: 10.69617/nuuz.v3i3.1.1947. Disponível em: http://journals.nuu.uz/index.php/actanuuz/article/view/1947. Acesso em: 2 may. 2026.