ТАШАТОВ, Алланазар; ЭШБОБОЕВ Cардор; ЭРГАШОВ, Ёкуб. APPLICATION OF ION IMPLANTATION FOR CREATION OF ULTRATHIN OHMIC CONTACTS ON THE SURFACE OF SILICON FILMS. «ACTA NUUz», [S. l.], v. 3, n. 3.1, p. 496–499, 2026. DOI: 10.69617/nuuz.v3i3.1.14201. Disponível em: http://journals.nuu.uz/index.php/actanuuz/article/view/14201. Acesso em: 7 nov. 2026.