ТАШАТОВ, Алланазар, ЭШБОБОЕВ Cардор, and Ёкуб ЭРГАШОВ. 2026. “APPLICATION OF ION IMPLANTATION FOR CREATION OF ULTRATHIN OHMIC CONTACTS ON THE SURFACE OF SILICON FILMS”. «ACTA NUUz» 3 (3.1):496-99. http://journals.nuu.uz/index.php/actanuuz/article/view/14201.