ТАШАТОВ, Алланазар, et al. “APPLICATION OF ION IMPLANTATION FOR CREATION OF ULTRATHIN OHMIC CONTACTS ON THE SURFACE OF SILICON FILMS”. «ACTA NUUz», vol. 3, no. 3.1, Aug. 2026, pp. 496-9, doi:10.69617/nuuz.v3i3.1.14201.