Yokub ERGASHOV, Sardor ESHBOBOEV, and Allanazar TASHATOV. “SURFACE MORPHOLOGY AND STRUCTURAL FEATURES OF NICKEL SILICIDE THIN FILMS FABRICATED BY ION-PLASMA DEPOSITION ”. «ACTA NUUz» 3, no. 3.2 (October 15, 2025): 494–497. Accessed December 5, 2025. http://journals.nuu.uz/index.php/actanuuz/article/view/9284.