ТАШАТОВ А, ЭШБОБОЕВ C, ЭРГАШОВ Ё. APPLICATION OF ION IMPLANTATION FOR CREATION OF ULTRATHIN OHMIC CONTACTS ON THE SURFACE OF SILICON FILMS. NUUz [Internet]. 2026 Aug. 6 [cited 2026 Sep. 6];3(3.1):496-9. Available from: http://journals.nuu.uz/index.php/actanuuz/article/view/14201