OBTAINING THIN FILMS OF SILICIDES MN4SI7, COSI2, FESI ON THE SURFACE OF SI BY DEPOSITION METHODS AND STUDYING THEIR PHYSICAL PROPERTIES
This article presents the formation patterns of thin films of Mn4Si7, CoSi2, and FeSi silicides by solid-phase deposition combined with annealing. The main mechanisms of formation of these metal silicides are elucidated. Their electronic and crystal structures are studied, including the valence electron density of state distributions and energy band parameters.
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