ELEKTROKIMYOVIY O‘YISH JARAYONIDA KREMNIY SIRT MORFOLOGIYASINING SHAKLLANISHI
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Mazkur maqolada anodik oʻyish usuli yordamida gʻovakli kremniy qatlamlarini olish texnologiyasi batafsil bayon etilgan. Tadqiqot davomida elektrokimyoviy oʻyish jarayoniga ta’sir etuvchi asosiy texnologik parametrlar, jumladan, HF kislotasi asosidagi elektrolit tarkibi, oqim zichligi, kuchlanish qiymati hamda oʻyish muddati tizimli ravishda tahlil qilingan. Shuningdek, kremniy plastinasining kristallik holati gʻovakli strukturaning shakllanishiga qay darajada ta’sir koʻrsatishi koʻrib chiqilgan. Olib borilgan eksperimentlar natijasida gʻovaklarning diametri, chuqurligi va qatlamning bir jinsliligi kabi muhim morfologik koʻrsatkichlarni aniq boshqarish imkonini beruvchi optimal texnologik rejimlar aniqlandi. Tadqiqot yakunida olingan ma’lumotlar asosida gʻovakli kremniy hosil qilish jarayonini barqarorlashtirish hamda ushbu usulni sanoat ishlab chiqarishiga tatbiq etish boʻyicha zaruriy texnologik tavsiyalar ishlab chiqilgan
1. Zhang, G. X. (2006). Porous silicon: morphology and formation mechanisms. In Modern aspects of electrochemistry (pp.
65–133). https://doi.org/10.1007/978-0-387-31701-4_2
2. Santos, A., & Kumeria, T. (2015). Electrochemical etching methods for producing porous silicon. In Springer series in
materials science (pp. 1–36). https://doi.org/10.1007/978-3-319-20346-1_1
3. Losic, D., & Santos, A. (2015). Electrochemically engineered nanoporous materials. In Springer series in materials
science. https://doi.org/10.1007/978-3-319-20346-1
4. Lytovchenko, V. (2017). Preparation and study of porous Si surfaces obtained using the electrochemical
method. Semiconductor Physics Quantum Electronics & Optoelectronics, 20(4), 385–
395. https://doi.org/10.15407/spqeo20.04.385
5. Smith, R. L., & Collins, S. D. (1992). Porous silicon formation mechanisms. Journal of Applied Physics, 71(8), R1–
R22. https://doi.org/10.1063/1.350839
6. Zhao, M., McCormack, A., & Keswani, M. (2016). The formation mechanism of gradient porous Si in a contactless
electrochemical process. Journal of Materials Chemistry C, 4(19), 4204–4210. https://doi.org/10.1039/c6tc00309e
7. Kumar, P., Lemmens, P., Ghosh, M., Ludwig, F., & Schilling, M. (2009). Effect of HF concentration on physical and
electronic properties of electrochemically formed nanoporous silicon. Journalof Nanomaterials, 2009(1).
8. https://doi.org/10.1155/2009/728957
9. Granitzer, P., Rumpf, K., Pölt, P., Reichmann, A., & Krenn, H. (2006). Self-assembled mesoporous silicon in the crossover
between irregular and regular arrangement applicable for Ni filling. Physica E Low-dimensional Systems and
Nanostructures, 38(1–2), 205–210. https://doi.org/10.1016/j.physe.2006.12.031
10. Kumar, P., & Huber, P. (2007). Effect of etching parameter on pore size and porosity of electrochemically formed nanoporous
silicon. Journal of Nanomaterials, 2007, 1–4. https://doi.org/10.1155/2007/89718
11. Lehmann, V., Stengl, R., & Luigart, A. (2000). On the morphology and the electrochemical formation mechanism of
mesoporous silicon. Materials Science and Engineering B, 69–70, 11–22. https://doi.org/10.1016/s0921-5107(99)00286-x
12. Kim, H., & Cho, N. (2012). Morphological and nanostructural features of porous silicon prepared by electrochemical
etching. Nanoscale Research Letters, 7(1), 408. https://doi.org/10.1186/1556-276x-7-408
13. Khinevich, N., Juodėnas, M., Tamulevičienė, A., Bandarenka, H., & Tamulevičius, S. (2021). Tailoring mesoporous silicon
surface to form a versatile template for nanoparticle deposition. Coatings, 11(6), 699.
14. https://doi.org/10.3390/coatings11060699
15. Klimenko, A., Kashko, I., Bondarenko, V., Astrova, E., Zhdanov, V., Rumyantsev, A. M., Amoros, P., Gomez, M., Cantarero,
A., & Matveeva, E. (2017). Planar Mesoporous Silicon Flakes with Microns Thicknesses As an Anode Material for Li-Ion
Batteries: Fabrication, Characterization and Electrochemical Tests. ECS Meeting Abstracts, MA2017-01(43),
2002. https://doi.org/10.1149/ma2017-01/43/2002
16. Kuntyi, О., Zozulya, G., & Shepida, M. (2022). Porous silicon formation by electrochemical etching. Advances in Materials
Science and Engineering, 2022, 1– https://doi.org/10.1155/2022/1482877
17. Ouyang, H., Christophersen, M., & Fauchet, P. M. (2005). Enhanced control of porous silicon morphology from macropore
to mesopore formation. Physica Status Solidi (A), 202(8), 1396–1401. https://doi.org/10.1002/pssa.200461112
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