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OBTAINING AND STUDYING THE PHYSICAL PROPERTIES OF NANOSIZED CoSi 2 PHASES IN THE SURFACE REGION OF SILICON

Nanoscale phases, optical absorption, degree of coverage, light transmission, ion implantation, silicide, annealing, ion dose, light intensity, band gap zone.

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By measuring the intensity of light passing through the studied samples of different frequencies and ultraviolet photoelectron
spectroscopy, the band gap Eg of nanocrystalline CoSi 2 phases created on the surface and in the near-surface region of Si by
ion implantation in combination with annealing was determined. Nanosized CoSi 2 phases on the silicon surface were obtained
by implanting Co ions with an energy E 0 = 1 keV; and in the near-surface region (at a depth of 15–16 nm) by implantation of
ions with Е 0 = 15 keV.Post-implantation annealing was mainly carried out by thermal heating. It is shown that nanocrystalline
CoSi 2 phases both on the surface and in the subsurface layer crystallize into a cubic lattice. It has been established that Eg of
nanocrystalline phases of cobalt silicides, depending on their size, can vary within 0.6–0.9 eV.

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